PRODUCTS / Semicon/Glass / Femtika

    Laser Nanofactory

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    • Introduction
    • Specification
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    Laser Nanofactory Technical Specifications

    Technology

    Multiphoton Polymerization

    Selective Laser Etching

    Hybrid

    Laser Source

    Femtosecond

    Laser

    Wavelength

    780nm

    1030±10nm

    515±10nm

    1030±10nm

    1030±10nm and

    515±10nm

    Repetition rate

    100MHz

    11 MHz ...

    76 MHz

    Single-shot –

    1 MHz

    Single-shot –

    1 MHz

    Single-shot –

    1 MHz

    Pulse duration

    <100 fs

    50 fs

    120 fs

    170 fs

    290 fs –

    20 ps

    (tunable)

    250 fs

    (450 fs) –

    10 ps (tunable)

    190 fs – 10 ps

    (tunable)

    Max. average power

    250mW

    2 W

    5 W

    10 W

    from 5 W

    to 20 W*

    Long-term

    Power stability

    < 0.5% RMS

    over 24 h

    < 0.5% RMS over 100 h

    Positioning

    Linear stages with synchronized Galvano scanners

    XYZ positioning stages mounted on grantite base with bridge

    Travel(XYZ)

    160 x 160 x 60mm

    Accuracy(XYZ)

    ±300nm

    Resolution(XYZ)

    1nm

    Maximum speed(XY)

    200mm/s

    Galvano Scanners

    Accuracy

    50μrad

    Repeatability

    0.4 μrad RMS