PRODUCTS / Semicon/Glass / Femtika
Laser Nanofactory
- Introduction
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Laser Nanofactory Technical Specifications |
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Technology |
Multiphoton Polymerization |
Selective Laser Etching |
Hybrid |
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Laser Source |
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Femtosecond Laser |
Wavelength |
780nm |
1030±10nm 515±10nm |
1030±10nm |
1030±10nm and 515±10nm |
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Repetition rate |
100MHz |
11 MHz ... 76 MHz |
Single-shot – 1 MHz |
Single-shot – 1 MHz |
Single-shot – 1 MHz |
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Pulse duration |
<100 fs |
50 fs 120 fs 170 fs |
290 fs – 20 ps (tunable) |
250 fs (450 fs) – 10 ps (tunable) |
190 fs – 10 ps (tunable) |
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Max. average power |
250mW |
2 W |
5 W |
10 W |
from 5 W to 20 W* |
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Long-term Power stability |
< 0.5% RMS over 24 h |
< 0.5% RMS over 100 h |
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Positioning |
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Linear stages with synchronized Galvano scanners |
XYZ positioning stages mounted on grantite base with bridge |
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Travel(XYZ) |
160 x 160 x 60mm |
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Accuracy(XYZ) |
±300nm |
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Resolution(XYZ) |
1nm |
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Maximum speed(XY) |
200mm/s |
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Galvano Scanners |
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Accuracy |
50μrad |
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Repeatability |
0.4 μrad RMS |
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